FEI Helios NanoLab G4 dual-beam focused ion beam

Location: 75 Shepherd Labs

Specifications:

Installed in the vibrationally isolated High Resolution Microscopy Center (HRMC).
Provides fast, accurate, and precise milling and deposition of complex structures with critical dimensions of less than 10 nm.
Ultimate SEM imaging resolution approaches 0.6 nm.

More detailed information is available at the vendor web site: www.fei.com/products/dualbeam/helios-nanolab/

Location: 74 Shepherd Labs

High resolution secondary electron imaging; backscatter electron imaging; energy dispersive spectroscopy; electron backscatter diffraction; and cathodoluminescence
Thermally-assisted field-emission gun
Accelerating voltage from 0.5 to 30 kV
Lateral resolution of 1.5 nm
Magnification ranges from 10 X to 400,000X
Sample size: 50 x 125 x 125 mm
Backscattered imaging at TV rates and low voltage using the Centaurus detector
Chemical analysis of bulk samples with elements as low as sodium available using a Thermo-Noran Vantage system
Cathodoluminescence analysis with a Gatan (Oxford) MonoCL 2 system
Crystallographic analysis with an EBSD system from HKL allowing pattern indexing and texture mapping with Channel 5 software