We have access to the following equipment through the Characterization facility!


Other SEMs Details can be found here!

FIB

FEI Helios NanoLab G4 dual-beam focused ion beam

Location: 75 Shepherd Labs

Specifications:

  • Installed in the vibrationally isolated High Resolution Microscopy Center (HRMC).
  • Provides fast, accurate, and precise milling and deposition of complex structures with critical dimensions of less than 10 nm.
  • Ultimate SEM imaging resolution approaches 0.6 nm.

More detailed information is available at the vendor web site: www.fei.com/products/dualbeam/helios-nanolab/

Apreo

Thermo Apreo 2S Lo-Vac

Location:  74 Shepherd Labs

Specifications:

  • High resolution secondary electron imaging; backscatter electron imaging; energy dispersive spectroscopy; electron backscatter diffraction; and cathodoluminescence
  • <1nm resolution at the optimum working distance and ~1nm resolution at the analytical working distance
  • Stage can hold up to 18 regular SEM stubs
  • 5-axis motorized eucentric stage, 110 x 110 mm2 with a 105° tilt range. Maximum sample weight: 5 kg in un-tilted position.
  • Lo-Vac feature enables the pressure to be raised up to 500Pa for charge suppression of non-conductive materials
  • Magnification ranges from 10 X to 400,000X
  • EDS using Oxford Instruments Ultimax 100mm2 with Aztec Live chemical imaging
  • Crystallographic analysis with an EBSD system from Oxford allowing pattern indexing and texture mapping with Channel 5 software at 5000 patterns per second